| abstract |
(57) Abstract: An alkali-soluble Si-containing polymer having high resolution and high etching resistance, which is easy to synthesize and control the molecular weight and is suitable as a resist material is provided. An alkali-soluble siloxane polymer represented by the following general formula. Embedded image [In the above formula, R represents a siloxane polymer residue, R 1 and R 2 each independently represent —H or a monovalent organic group, and R 3 and R 4 each independently represent —H, —Cl or monovalent. Represents a valent organic group, R 5 independently represents —H or a monovalent organic group (provided that 50% or more of the groups R 5 are —H. , M is an integer of 1 to 3, and n is 1 Or 2, and a and b are integers of 1 or more] |