| abstract |
(57) Abstract: The present invention is excellent in safety, free from unpainted portions, failures such as striations, excellent in coating uniformity and storage stability of a solution, and moreover, hygroscopicity, sensitivity, Provided is a positive photoresist composition having excellent resolution, heat resistance and resist shape. SOLUTION: (a) Alkali-soluble resin, (b) 1, 2-naphthoquinonediazide-4- (and / or -5) A positive photoresist composition comprising a sulfonate ester and (c) an alkoxybutyl acetate and / or an alkoxypentyl acetate which may have a substituent. |