| abstract |
(57) Abstract: [PROBLEMS] To provide a silica glass that has a high light transmittance for deep ultraviolet rays and is resistant to deep ultraviolet rays, and a method for producing the same. SOLUTION: The high for deep ultraviolet rays has a set fictive temperature of 500 to 1000 ° C., an oxygen deficiency type defect concentration of 5 × 10 16 defects / cm 3 or less, and an oxygen excess type defect concentration of 5 × 10 16 defects / cm 3 or less. Pure silica glass and transparent silica glass formed by using a high-purity silicon compound at 500 to 1000 ° C. A method for producing high-purity silica glass for deep-ultraviolet rays, which comprises setting a virtual temperature for 0 to 2000 hours. |