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filingDate 1996-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_56d87ba646f2d23835b0418beb1426b9
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publicationDate 1997-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H09235114-A
titleOfInvention Method for producing metallic silicon particles having copper silicide
abstract (57) Abstract: To provide metal silicon particles having copper silicide on at least the particle surface. SOLUTION: The elementary metal silicon particles having an average particle diameter of 50 μm to 2 mm and the copper (I) chloride particles and / or copper (II) chloride particles having an average particle diameter of 1 mm or less are at least under an atmosphere of non-oxidizing gas. A method for producing metal silicon particles having copper silicide on at least the particle surface by heating to a temperature of 250 ° C.
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