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filingDate 1996-02-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_340a19fd1c8e2e670483f92df2886fb9
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publicationDate 1997-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H09234379-A
titleOfInvention Method for regenerating or cleaning anion exchange resin
abstract (57) 【Abstract】 PROBLEM TO BE SOLVED: To highly clean anion-exchange resin, particularly an anion-exchange fiber filter used in a clean room of a semiconductor manufacturing factory at the time of its production and also at the time of its regeneration. A method for regenerating or cleaning an anion exchange resin is provided. A method for regenerating or cleaning an anion exchange resin, which comprises contacting the anion exchange resin with a rinse liquid composed of an aqueous solution of a predetermined organic quaternary ammonium compound in the cleaning treatment of the anion exchange resin. [Effect] Not only the anion component but also the pollutant component such as alkali metal can be highly reduced, so that the anion exchange resin can be highly cleaned at the time of production and the anion exchange resin once used. The resin can be regenerated or highly regenerated after the regeneration, and is particularly suitable for cleaning an anion exchange fiber filter used in a clean room of a semiconductor manufacturing factory.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010234339-A
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priorityDate 1996-02-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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