http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H09230596-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_385752f237551ca1b257f160a0f2434b |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 |
| filingDate | 1996-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f644c62ce88ccaaab4698b6a17dd581 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e95f35111d8a2d3f9ee66f262cb3d467 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4071af2dc460bef152beb896511b7773 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8c4f57b43dfdcd57b341e0f79d59f218 |
| publicationDate | 1997-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H09230596-A |
| titleOfInvention | Radiation-sensitive resin composition |
| abstract | (57) 【Abstract】 PROBLEM TO BE SOLVED: To produce an alkali for an IC, a TFT circuit for an LCD, etc., which is excellent in chemical resistance, sensitivity, developability, residual film rate, heat resistance and adhesion to a substrate. To provide a radiation-sensitive resin composition suitable as a positive resist which can be developed by a developer comprising an aqueous solution. SOLUTION: [A] (a-1) polymerized units of unsaturated carboxylic acid and (a-2) the following general formula [I]: embedded image (wherein R 1 to R 3 are independently hydrogen. An atom or an alkyl group having 1 to 5 carbon atoms, and R 4 has 1 to 5 carbon atoms Is an alkyl group, and m and n are each independently an integer of 1 to 5. ) A radiation-sensitive resin composition containing a copolymer containing polymerized units of a compound represented by the formula (1), [B] 1,2-quinonediazide compound, and [C] a latent acid generator. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005338849-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014137523-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7037994-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H10153854-A |
| priorityDate | 1996-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 314.