http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H09223800-A

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filingDate 1996-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fe24d1ed587df9976b29b4a67444df69
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publicationDate 1997-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H09223800-A
titleOfInvention Thin film manufacturing method and thin film transistor manufacturing method
abstract (57) [Summary] [Problem] Source / drain regions cannot be sufficiently activated. SOLUTION: An active semiconductor layer 2 and a gate insulating layer 3 are deposited on a transparent glass substrate 1. Gate electrode 4 on it Then, ions containing phosphorus P and ions containing hydrogen H are accelerated by an accelerating voltage and introduced into the active semiconductor layer 2 in order. At this time, the latter accelerating voltage of ions containing hydrogen H is set to the former phosphorus P. The source region 5 and the drain region 6 are formed by setting the voltage lower than the acceleration voltage of the ions including. After forming the interlayer insulating layer 7, the contact hole 11, the source electrode 8 and the drain electrode 9 are formed to obtain a thin film transistor. As a result, the source / drain regions 5 and 6 are sufficiently activated. Resistance can be reduced.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6579749-B2
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