| abstract |
(57) [PROBLEMS] To provide a positive resist composition having excellent heat resistance and resolution, which does not substantially generate scum and which is suitable for use in the field of semiconductor device manufacturing, which particularly requires fine processing. To do. SOLUTION: A weight average molecular weight of 2,000 separated from a reaction product obtained by reacting phenols and aldehydes in the presence of an acidic catalyst in a mixed solvent of γ-butyrolactone and propylene glycol monoalkyl ether. ~ A positive resist composition containing an alkali-soluble novolac resin in the range of 15,000 and a quinonediazide group-containing compound and substantially no scum is generated. |