http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H09220505-A

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filingDate 1996-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_858ab42743712f714b9cf300059ba47d
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publicationDate 1997-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H09220505-A
titleOfInvention Method for dissolving a silica-based coating formed on a substrate surface
abstract (57) Abstract: When the SOG film formed on the surface of the substrate is dissolved and removed from the peripheral edge of the substrate, the film does not rise at the end portion of the SOG film and cracks occur at the end portion of the SOG film. Provided is a film melting method capable of preventing generation of particles due to breakage of a raised portion of an SOG film without causing the occurrence of particles. SOLUTION: Cyclohexanone, γ-butyl lactone, lactic acid is used as a film dissolving liquid that is discharged from a needle-shaped nozzle 16 on the peripheral portion of a rotating substrate W having an SOG film formed on its surface to dissolve and remove the SOG film on the peripheral portion of the substrate. Use ethyl or ethyl pyruvate.
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priorityDate 1996-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 43.