http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H09218501-A

Outgoing Links

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L1-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-62
filingDate 1996-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3f241a91c71ca3298d350029024188b9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_38cbc454dad2b8d42ad4baf0cd6ffe81
publicationDate 1997-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H09218501-A
titleOfInvention Dustproof film for photomask protection
abstract (57) Abstract: An object of the present invention is to provide a dustproof film for protecting a photomask, which has a high light-transmitting property, is excellent in light resistance, and has a long life. A dust mask for protecting a photomask is formed of cellulose propionate having a weight average molecular weight of 60,000 to 470,000 according to polystyrene standard.
priorityDate 1996-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 27.