http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H09213257-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e5db580deca7130dbe51805c6c608b35 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-305 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-147 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-09 |
| filingDate | 1996-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7fe70e06a05c9cdcb4385ce8722c5560 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_93030122a2b6292d8d84f4086cadc4b7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5ce017ba54dfdfdd327413ab6f3e8636 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6af86e4e1983da4c4b24fd390c2d28b4 |
| publicationDate | 1997-08-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H09213257-A |
| titleOfInvention | Electron beam exposure apparatus and electron beam exposure method for reducing electron beam current amount |
| abstract | Kind Code: A1 Abstract: The present invention eliminates the risk of melting due to heat generation of components by cutting an excess electron beam in an electron beam exposure apparatus and method, and achieves a high-speed blanking operation. And further reduce the possibility of contamination attachment and charge accumulation. An electron beam exposure apparatus that shapes an electron beam emitted from an electron beam generation source by irradiating an exposure pattern forming aperture and allows the electron beam to pass therethrough, and irradiates a sample with the shaped electron beam for exposure. An electromagnetic lens for forming a crossover image, a first plate having a circular opening for shaping the electron beam by cutting a peripheral portion of the crossover image formed by the electromagnetic lens, and a first plate for the flow of the electron beam. The exposure pattern forming opening is irradiated with the electron beam shaped by the circular opening including the second plate having the opening for reducing the current amount of the electron beam upstream of the first plate. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013544031-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007080667-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010282977-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007500948-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010010170-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4621097-B2 |
| priorityDate | 1996-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 33.