http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H09202971-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-27 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-511 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50 |
filingDate | 1996-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0fd4fd076ec6c357f72c713ae99ce5ce http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_97e894b64a8d8f3a799376e781ac202b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ba8aa5a6ecc6ffb09bb5be4b7848b646 |
publicationDate | 1997-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-H09202971-A |
titleOfInvention | Magnetic recording medium manufacturing apparatus and manufacturing method thereof |
abstract | (57) Abstract: A method for manufacturing a magnetic recording medium having a protective film with good durability is provided. A plasma source 1 including ECR, HWP, and ICP that generates high-density plasma at low gas pressure. When the substrate 3 is electrically insulated, plasma is generated from the plasma source 1 by the plasma processing apparatus including the high frequency electrode 4 provided at a position away from the back surface of the substrate 3, A high-frequency electrode 4 is applied with a bias to supply energy necessary for desorption of excess hydrogen, and a diamond-like carbon protective film is formed on the substrate 3 on the holder 2 regardless of the substrate type. is there. |
priorityDate | 1996-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 25.