| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d4ada69388e0a1b68daaf536597c732 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-36 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-314
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B35-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 |
| filingDate |
1996-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_99946e8c8872581d6a2730d934586b24 |
| publicationDate |
1997-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H09186153-A |
| titleOfInvention |
Method for depositing amorphous SiNC coating |
| abstract |
Kind Code: A1 Abstract: A novel chemical vapor deposition method that provides an amorphous silane coating containing silicon, carbon and nitrogen. A reactive gas mixture containing an organosilicon material and a nitrogen source is introduced into a deposition chamber containing a substrate to be coated and reacted to form a coating. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002134494-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6911405-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180122619-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10559459-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002083870-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004289105-A |
| priorityDate |
1995-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |