http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H09167733-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0950e9df7f0e1b73efee1bda859951ad |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 1995-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b43c31ae817426e53a0612de5912f591 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_21c7c58cbbddd5736d90f246f12075b5 |
| publicationDate | 1997-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H09167733-A |
| titleOfInvention | Pattern formation method |
| abstract | (57) Abstract: By increasing the etching rate of an organic film interposed between a resist and a film to be processed, it is possible to suppress the abrasion of the resist pattern and the dimensional conversion difference during the etching of the organic film. In a pattern forming method using an organic film functioning as an antireflection film, a resist 13 is applied on a poly-Si film 11 on which a pattern is to be formed via an organic film 12 containing polysulfone as a main component, A resist pattern is formed by exposing and developing, and then the organic film 1 2 is irradiated with an electron beam to cause a main chain cleavage reaction to accelerate the etching rate, and then the organic film 12 is selectively etched using the resist pattern as a mask. Then, the resist pattern and the organic film 12 are used as a mask to form the poly-Si film. 1 1 is selectively etched. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6255225-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100675875-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013044887-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008085330-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6090523-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104916530-A |
| priorityDate | 1995-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 26.