Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c7ad58d3c0b071069a8ee0cb8c8ba2e8 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K2103-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K2103-42 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0037 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G11B7-245 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G11B7-2535 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G11B7-2534 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G11B7-2533 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C67-00 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J3-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B7-245 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B7-2535 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B7-2533 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23K26-402 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B7-2534 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
filingDate |
1996-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_82bba395479ca071d827ad58f1a4cac5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d7b12b42b9a12280f0d3ee67628fca6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_37a9c888bf8d767590695feefcfbaad9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7969e05fad057d2deddd947bd6b0faaa |
publicationDate |
1997-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-H09136968-A |
titleOfInvention |
How to create microstructures in polymers |
abstract |
(57) Abstract: A method for producing a fine structure in a polymer. According to the present invention, a polymer substrate having a wavelength of 260 is used. To 360 nm to irradiate the polymer matrix in the irradiated region to produce microstructures in the polymer matrix, wherein the polymer is represented by Formula I At least 5 mol% of the structural unit represented by is included. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2005026238-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007091466-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7608371-B2 |
priorityDate |
1995-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |