http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H09134861-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate | 1995-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_86602f10a74db18b3a843384f7f2ef04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f391941129787a7ec333ada64f69026 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_87d51c02153446b20af586d7a8e73e32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bf32194dd83a67a5e3945bd6cd605855 |
| publicationDate | 1997-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H09134861-A |
| titleOfInvention | Charged particle beam exposure method and apparatus |
| abstract | (57) Abstract: A charged particle beam exposure method and an apparatus therefor capable of exposing a fine pattern stably and with high accuracy. SOLUTION: The film thickness of a contaminant film adhered to the surface of a portion (particularly, beam forming diaphragm plates 5, 11 etc.) where contamination is likely to occur due to irradiation of a charged particle beam inside a mirror of a charged particle beam exposure apparatus is measured. Film thickness measuring means 10, 9 and 17 are provided for this purpose, and the diaphragm opening pattern of the beam forming diaphragm plate 11 is replaced with a clean one based on the film thickness measurement result by this film thickness measuring means, or Contaminant film removing means 52, 53, 54 built in the mirror body, The contaminant film is removed using 55, 56 or the like. [Effect] The state of surface contamination of the beam forming diaphragm plate etc. in the mirror body is constantly monitored, and the beam forming diaphragm plate etc. can be replaced or cleaned quickly and easily before the contamination contamination exceeds the allowable limit. Therefore, highly precise pattern exposure can be stably continued for a long time. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014175573-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9449792-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005038641-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8928855-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011517135-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003077814-A |
| priorityDate | 1995-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 27.