| abstract |
(57) [Abstract] [PROBLEMS] To enable uniform attachment of particles for contamination evaluation to a substrate for contamination evaluation, production of evaluation samples having the same particle distribution, and highly accurate contamination evaluation. SOLUTION: A spin chuck 2 for rotating and holding a wafer W for contamination evaluation is arranged in a processing chamber 1 in which an atmosphere of a predetermined temperature is formed, and dried particles to be contaminated are provided above the processing chamber 1. A particle supply means 4 for supplying 3 is provided. As a result, the dried particles 3 generated by the particle supply means 4 are supplied onto the rotating wafer W, and the particles 3 are deposited on the surface of the wafer W. Can be evenly adhered (applied). |