http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H09124938-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b19eaa8e535da4e4bceed99917a68153 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L79-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-541 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-544 |
| filingDate | 1995-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5c821969b67a1c4d1983a7c687e70832 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0fc688915e4d9d3858a7e870ad357099 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_545ab069a1d0b17807b024864a9ba908 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c3138fde95eafe03cf6c9a8cf3984f15 |
| publicationDate | 1997-05-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H09124938-A |
| titleOfInvention | Method for producing photosensitive resin composition |
| abstract | (57) Abstract: A method for producing a photosensitive resin composition having excellent adhesiveness is provided. Amino group-containing organosilicon compound 0.1 to 5.0 mol% and H 2 N-R-NH 2 is from 95.0 to 99.9 Obtained by reacting 0.95 to 1.05 mol of a dicarboxylic acid compound having a specific structure with 1 mol of an amine component consisting of 1 mol% in an organic polar solvent at a temperature of 0 to 50 ° C. in the presence of a condensing agent. A method for producing a photosensitive resin composition, which comprises adding a photopolymerization initiator and / or a photosensitizer to a photosensitive resin. |
| priorityDate | 1995-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 251.