http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H09118977-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b3cfdc2686d10506a737643e3e739e39 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-0021 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-203 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-00 |
| filingDate | 1996-06-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d6af2779219bec295a8d83c05bd5cdcd |
| publicationDate | 1997-05-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H09118977-A |
| titleOfInvention | How to deposit thin films |
| abstract | Kind Code: A1 Abstract: Deposition is performed at a reduced substrate temperature while maintaining or improving film properties. A baffle plate 7 divides the interior of a vacuum chamber 1 into an upper part, a central part, and a lower part. A plasma is generated by a helicon wave in the upper part of the chamber 1, and a material source 10 to be evaporated is provided in a lower part of the chamber. A substrate 9 to be coated above the baffle plate and passing vaporized material through the opening of the baffle plate into a plasma to deposit a thin film coating for deposition on the substrate. |
| priorityDate | 1995-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556224 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID2244 |
Total number of triples: 16.