Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_454749a328367422e1d73db68159d445 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01L5-0047 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81C1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L49-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-84 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate |
1995-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f640df3a265e2fbc2d1a41b5b215ec48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7ed419628c6655afec17ca07b25f3b64 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_54739e70c1f78d00976e577088102d28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_473d09ebb4656e4292a726ca417660f5 |
publicationDate |
1997-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-H09107113-A |
titleOfInvention |
Method for manufacturing silicon membrane having adjusted residual stress |
abstract |
(57) Abstract: A silicon membrane for a micromachine having an accurate residual stress or a uniform stress distribution in a plane direction or a thickness direction is obtained. A silicon membrane having a low impurity doping density but no stress is prepared, and then an appropriate amount of impurities is doped into the membrane. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009016728-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108525609-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018161643-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108525609-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023090777-A1 |
priorityDate |
1994-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |