http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0892749-A

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filingDate 1994-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5378cc3ec5695d3b83c3cff4aaf01deb
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publicationDate 1996-04-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H0892749-A
titleOfInvention Method for producing ruthenium oxide thin film
abstract (57) [Summary] [Objective] A method for producing a ruthenium oxide thin film, which is capable of producing a single-phase ruthenium oxide thin film by an inexpensive and simple method, and which is capable of producing a ruthenium oxide thin film having excellent electric characteristics. provide. [Structure] A mass of ruthenium chloride, which is a raw material, is crushed into a powder and then dissolved in ethanol as a solvent to prepare a precursor sol solution. The precursor sol solution has a pore size of 0.5. After passing through a filter having a size of not more than μm, it is applied to the substrate and heat-treated. The heat treatment temperature is 600 ° C to 900 ° C.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100577698-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100970575-B1
priorityDate 1994-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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