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filingDate 1995-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3e33f32e68692145e7ef0fd89ed20694
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publicationDate 1996-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H0887959-A
titleOfInvention Method of manufacturing microchip for electron source and microchip for electron source obtained by this method
abstract (57) [Abstract] [Objective] A method for manufacturing a microchip for an electron source capable of improving the characteristics of a cathode of the microchip and the uniformity on a large surface, and a microchip for an electron source obtained by using the method. Aim to get chips. A method of manufacturing the electron source according to the present invention includes a system of a cathode conductor (8), a grid (10a) placed on an intermediate insulator 23, and a microchip () deposited on the cathode conductor. 18) and the grid has a lower surface (I) Is located geometrically between the upper surface (S) and the upper surface (S), and is characterized in that the microchip is subjected to a first cleaning step, followed by a finishing or improving step by surface etching. The microchip of the present application consists of two parts.
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priorityDate 1994-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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