http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0887109-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d93502a23a72b56472bc75854cfe7c60 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
filingDate | 1994-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1a3c9e699e9defbdf27909ba324ee5f6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_55c22f997810e59aa3a164644ea41da0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bc40c4333f863fbd4baf79b5edf4b7e2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb9df332f02eed3f0dcdb9972eb7bda4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ba29641f94696f585e6eb7fc56c46837 |
publicationDate | 1996-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-H0887109-A |
titleOfInvention | Positive resist composition |
abstract | (57) [Summary] [Purpose] To provide a positive photosensitive composition capable of preventing halation without impairing sensitivity, resolution and depth of focus. A positive resist composition containing an alkali-soluble phenol resin (a), a quinonediazide sulfonate ester-based photosensitizer (b), and a compound (c) represented by the following general formula (I). Embedded image (R 1 and R 2 may be different from each other and are a hydrogen atom, a halogen atom, a hydroxyl group, a substitutable alkyl group, a substitutable alkoxy group, and -OCOR 3 , and X and Y may be different from each other, a cyano group, and -COOR. 4 , a carboxyl group and a nitro group, and R 3 to R 4 may be different from each other and are a substitutable alkyl group.) |
priorityDate | 1994-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 262.