http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0882926-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
| filingDate | 1995-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dbdeb35ed9bb63e0b282d7997935ef68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a97a0f2e32d6a6ca0991d97db11bb0e4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fbb3e46230391982f2fea7b459be7d08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_081a8845a6b3575616582c6f33a37df7 |
| publicationDate | 1996-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H0882926-A |
| titleOfInvention | Method of manufacturing resist pattern for semiconductor device |
| abstract | (57) [Summary] [Structure] (A) A weight ratio of naphthoquinone-1,2-diazidosulfonic acids of 2,3,4-trihydroxybenzophenone to 2,3,4-trihydroxybenzophenone is 20:80 or more. A photosensitive component contained in a ratio of 55:45 and (B) a novolak resin having a weight average molecular weight of 25,000 or more (in terms of polystyrene) are dissolved in an organic solvent in a weight ratio of 1: 9 to 1: 1. To prepare a positive photoresist solution, then apply this solution on a substrate for semiconductor devices, dry it to form a photosensitive layer, and selectively irradiate it with actinic rays, and then only the exposed area with an alkaline solution. A resist pattern for a semiconductor device is manufactured by melting and removing. [Effect] A resist pattern having high sensitivity and excellent in heat resistance and dry etching resistance can be obtained without generating scum during development. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100673622-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7314810-B2 |
| priorityDate | 1995-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 36.