| abstract |
(57) [Summary] [Purpose] The performance is equivalent to or better than the case where a cell-solve solvent such as ECA is used as a positive photoresist, it has high precision, good coatability, and variation in film thickness. A radiation-sensitive resist composition which can be minimized and is excellent in safety and environmental hygiene. [Structure] In a radiation-sensitive composition containing an alkali-soluble resin, a radiation-sensitive compound having a quinodiazide group, and a solvent, cyclohexyl acetate represented by the following general formula (1) is blended as a solvent. Embedded image |