http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0859297-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1a2d69b3b39c112c92c0c38cf3f6756d |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C15-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-02 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C17-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C15-00 |
| filingDate | 1994-08-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9cb18fd65cd4a321b302f08f1c738c14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_83927f3816523e803f8cd5c9f27685ae http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_53263f6bc0916816b1c1d0d15ffd85a6 |
| publicationDate | 1996-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H0859297-A |
| titleOfInvention | Method for manufacturing nesa film having fine pattern |
| abstract | (57) [Abstract] [Purpose] To inexpensively and easily form a nesa film having a delicate pattern having a line spacing and a line width of 30 μm or less on a glass substrate by a so-called lift-off method using a photoresist. It is to provide a method that can. [Structure] A photoresist is coated on a glass substrate, exposed through a mask, and then developed to form a photoresist film having a desired pattern. First step, a photoresist film having the above pattern is formed. The second step of forming a Nesa film on the entire surface of the glass substrate, and then removing the photoresist film on the glass substrate together with the Nesa film thereon. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002208324-A |
| priorityDate | 1994-08-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 30.