| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 |
| filingDate |
1994-07-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ac5a1790701329eec7bdeea379cb30d1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0236b6c4a6459e2b0498ca1312964474
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_11531eae1a6680aa4439d9d7f0888037
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_15f4f159952d44fc6b6531069b7c82d3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d8be7b85493d0d3a050d0a247e5e48d6 |
| publicationDate |
1996-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H0855803-A |
| titleOfInvention |
Thin film manufacturing method |
| abstract |
(57) [Summary] [Object] An object of the present invention is to provide a thin-film manufacturing method in a single-wafer LPCVD method in which the thickness of a deposited film does not fluctuate between relatively early cycles of continuous deposition processing. . [Structure] Prior to continuously performing vapor deposition on a wafer, a preliminary step of forming the same thin film on an exposed surface such as a susceptor in a process chamber is performed. If a thin film having a certain thickness or more is previously formed on the susceptor or the like and vapor deposition is continuously performed on the wafer, the temperature in the process chamber does not fluctuate during each cycle of the continuous vapor deposition. As a result, the thickness of the thin film deposited on each wafer becomes constant, so that a thin film manufacturing method with high yield is provided. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004086475-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9837271-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008205517-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9443730-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015204325-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10460932-B2 |
| priorityDate |
1994-07-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |