http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H083757-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c6191997ed6dda6a5a3582e10b0b3dbc
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-3457
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-244
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-52
filingDate 1994-06-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_26bbbb3d9d4e6f83303719313c8d4bbe
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_570a34e41118b74f8d4ddf4139fb143a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e2f286f15240b6379f23dba1ea261896
publicationDate 1996-01-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H083757-A
titleOfInvention Tin-lead alloy electroless plating copper-based material manufacturing method
abstract (57) [Summary] [Purpose] Stability of "tin-lead alloy electroless copper-based material" that has a plating film with minimal variation in film thickness and composition and excellent reflowability and wettability with base materials. Established manufacturing method. [Structure] A tin-lead alloy electroless plating layer is formed. Preliminary plating is performed to deposit a porous tin-lead alloy film on a copper-based substrate, and then substitutional tin-lead alloy electroless plating is deposited. After the treatment, it is further immersed in "an acidic aqueous solution containing chlorine ions and benzimidazole or its derivative". In this case, as the "substitution type tin-lead alloy electroless plating deposition treatment" performed after the pre-plating treatment, "tin-lead alloy electroless plating deposition treatment with a plating solution that produces a high tin content deposit" And the following "tin with a plating solution that produces a high lead content precipitate- It is preferable to apply a two-stage substitutional tin-lead alloy electroless plating deposition treatment method of "lead alloy electroless plating deposition treatment".
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100865923-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107365986-A
priorityDate 1994-06-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID73212
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID447556883
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID12749
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID312
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID25514
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5352426
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID2723790
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID21654078
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5798
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID12998085
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID414871446
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID253881
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559212
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6395
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID1549517
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID452826178
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID22497
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID418354341
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID2723631
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419546714
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559517
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID416158178
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID259
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID16700422
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID521261
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23672301
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523826
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID449949725
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID453116950
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID443297
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID28118
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID2735009
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID453757922
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID407378349
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID421351823
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415989538
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID409283606
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419524915
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419558638
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID10690
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID9548686
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419579089
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID406954886
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23978
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID451403949
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID420230429
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID447653462
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24409
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419583149
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419486558

Total number of triples: 70.