| abstract |
(57) Abstract: The present invention provides an ablative photodegradable polymer having a light absorber bound to the polymer, which does not undergo phase separation or crystallization. The ablative photodegradable polymer provides uniform ablation and high resolution and, in a preferred embodiment, resists potassium permanganate etchant and ferric chloride etchant. The ablative photodegradable polymer is peelable, but can be left on the substrate if desired. This ablative photodegradable polymer comprises a polymer in which a light absorber is covalently or ionically bonded. The invention also relates to a method of forming a metal pattern on a substrate using an ablative photodegradable polymer. |