http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H08323878-A

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classificationIPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29K25-00
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29D7-01
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C71-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C55-12
filingDate 1995-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_75169bdd42220e74b25d121a768d1eeb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_23509d8fa73434e9132302edb2727ceb
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publicationDate 1996-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H08323878-A
titleOfInvention Syndiotactic polystyrene biaxially stretched film
abstract (57) [Summary] [Object] The present invention provides a syndiotactic polystyrene biaxially stretched film having excellent flatness after a metal vapor deposition treatment, more specifically, a metal vapor deposition film capacitor or a metal vapor deposition packaging film. The present invention relates to a syndiotactic polystyrene biaxially stretched film having a thickness of 25 μm or less, which has good flatness after metal deposition. [Structure] A syndiotactic polystyrene having a thickness of 25 μm or less, which is composed of a styrene-based polymer having a substantially syndiotactic structure and has a value of 0.01 or less calculated by the following formula. System biaxially stretched film. [Amax / 90 (°)] × [HSmax / R]
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021070863-A1
priorityDate 1995-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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