http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0832078-A

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filingDate 1994-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2627974b94ebbe182a376fa15d81bafd
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publicationDate 1996-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H0832078-A
titleOfInvention Semiconductor device and manufacturing method thereof
abstract (57) [Abstract] [Purpose] To reduce the value of OFF current in thin film transistors. [Structure] A side surface of an active layer forming a thin film transistor is annealed by irradiation with laser light. Defects generated during patterning are concentrated on the side surface of the active layer, The movement of carriers due to this defect causes an OFF current. Therefore, by improving the crystallinity of the side surface of the active layer to reduce the defects, The current can be reduced.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7312483-B2
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priorityDate 1994-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 24.