http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H08316278-A

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filingDate 1996-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_341f2cb77cd5a481d24e17737be24a60
publicationDate 1996-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H08316278-A
titleOfInvention Uniform density charge attachment source
abstract (57) Abstract: A method for measuring the thickness of a very thin oxide layer on a silicon substrate is provided. A corona discharge gun including a biased needle electrode that provides an ion source of a given polarity at a tip, the biasing focus working ring electrode and a biased disk including a disk having a hole in a central portion. Masking electrodes, The ring electrode, the disk, and the needle electrode are insulated and supported so as to be arranged coaxially with each other, and the ring electrode is arranged in the middle of the needle electrode and the masking electrode. , Corona discharge gun.
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Total number of triples: 24.