http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H08314142-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e415f6f1eeb8706d299ea086326248bf |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 1996-05-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e6342379f267837e4951da7476d052b4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_12e54befea21c905c0a5610502e28ff7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bc32b3b6d76da442d06dbe46d471bf62 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4b035b50f2fc269b1911b9539bad6b60 |
| publicationDate | 1996-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H08314142-A |
| titleOfInvention | Acid catalyst positive resist |
| abstract | (57) Abstract: It is an object of the present invention to provide a photoresist composition suitable for deep UV exposure and capable of forming a high resolution shape of submicron size. The present invention relates to an alkali-soluble resin binder having a hydroxyl group, a dissolution inhibitor having an acid labile group that is cleaved when contacted with an acid generated by light, and exposure to an activating electromagnetic wave or particle beam. What is claimed is: 1. A positive photoresist composition comprising a combination with an acid-generating compound, wherein the resin binder has a group that is inactive with respect to a photo-generated acid when a subordinate portion of the hydroxyl group is reacted. And the acid generator is present in an amount sufficient to liberate sufficient acid to cleave the acid labile group in the dissolution inhibitor when exposed to activating electromagnetic waves or particle beams. Thus, the photoresist becomes soluble when exposed to an activating electromagnetic wave or a particle beam. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2424649-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2005050319-A1 |
| priorityDate | 1995-05-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 175.