| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d93502a23a72b56472bc75854cfe7c60 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
| filingDate |
1994-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9608ab9e3cc60c8eb87832680e0ab899
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b159307681fe01f7ee6b3c5293474175 |
| publicationDate |
1996-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H0829978-A |
| titleOfInvention |
Positive resist composition |
| abstract |
(57) [Abstract] [Purpose] To provide a positive photosensitive composition having various characteristics such as sensitivity, resolution and residual film rate. A positive photosensitive composition containing an alkali-soluble resin and a quinonediazide ester of a tetranuclear phenol compound having a specific structure. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100291604-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6448383-B2 |
| priorityDate |
1994-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |