http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H08292648-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_be92719b856db86c092cc233e9512ca2 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B25-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03G15-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B65H5-02 |
| filingDate | 1995-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d4f26bae7408c6b21ea879497d14af7d |
| publicationDate | 1996-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H08292648-A |
| titleOfInvention | Transfer conveyor belt and transfer device |
| abstract | (57) [Abstract] [Purpose] Good transferability and transportability even in low temperature, low humidity environment, high temperature, high humidity environment, with almost no unevenness in resistance in the circumferential direction of the belt, variation in resistance over time, and resistance value variation during manufacturing. Provided is a transfer / conveying belt that can secure the above. According to the present invention, in a transfer / conveying belt 6 for electrostatically transferring a toner image formed on an image carrier 1 onto a transfer material 15 and for conveying the transfer material 15, the structure has a volume specific resistance. The first layer having a volume resistivity of 1 × 10 10 to 1 × 10 16 Ω · cm, the second layer having a volume resistivity of 1 × 10 7 to 1 × 10 10 Ω · cm, and the volume resistivity of 1 × 10 10 ~ 1 x 10 16 Ω A three-layer structure consisting of a third layer of cm 2 is used, and the second semiconductive layer is a rubber layer utilizing the conductivity of the polymer itself. [Effect] With the above structure, stable transferability and transportability can be obtained without uneven resistance in the circumferential direction of the belt, variation in belt resistance with time, and resistance variation during manufacturing. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7713458-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005115015-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-100377014-C http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7144621-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7856200-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006184787-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6728502-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002212343-A |
| priorityDate | 1995-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID425966752 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID3085227 |
Total number of triples: 22.