http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H08292577-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1af8df51ce24ca931ae718fb747f6aa0 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41J2-05 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41J2-16 |
| filingDate | 1995-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_48ebc43bead0b5b95b9e177035409ced |
| publicationDate | 1996-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H08292577-A |
| titleOfInvention | Method of manufacturing resist pattern and method of manufacturing liquid jet recording head using the same |
| abstract | (57) [Summary] [Purpose] To manufacture a resist pattern with high three-dimensional shape accuracy. [Structure] A resist film 2 is provided on a substrate 1, and a photomask 3 is overlaid and exposed. As shown in (c), ashing treatment by plasma is performed in the vacuum chamber 10 to reduce the film thickness of the resist film 2 to a predetermined value t, and then the exposed portion 2a of the resist film 2 is removed by development to form a pattern. Opening 4 A resist pattern 4 having a is obtained. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20030025204-A |
| priorityDate | 1995-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 19.