| abstract |
(57) [Summary] [Object] To provide a negative resist composition having high photosensitivity or radiation sensitivity and excellent resolution, and a method for producing a resist image using the same. [Structure] Alkaline aqueous solution soluble resin, bromomethyl aryl ketone or dibromomethyl aryl ketone, amino resin and the following general formula (I): [Wherein, X, Y and Z each independently represent an alkyl group, a hydrogen atom, a chlorine atom or a bromine atom] and a negative resist composition containing a phenol compound represented by the formula, and the composition is applied onto a substrate, A method for producing a resist image, which comprises, after drying, exposing or irradiating with actinic radiation, heating, and then developing with an aqueous alkali solution. |