http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H08279500-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e5db580deca7130dbe51805c6c608b35 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 |
| filingDate | 1995-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_570e3116174dfb84048c7f3d5972a827 |
| publicationDate | 1996-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H08279500-A |
| titleOfInvention | Method of forming insulating film |
| abstract | (57) [Abstract] [Purpose] Regarding the method for forming an insulating film, the dielectric constant is SiOF. Provided is an interlayer insulating film composed of an organic insulating film which is lower than the film and has excellent heat resistance. [Structure] Glassy carbon film 2 on silicon substrate 1 Is deposited, the silicon substrate 1 is exposed to a fluorinated atmosphere 3 to fluorinate the glassy carbon film 2 and convert it into a fluorinated glassy carbon film 4. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11091830-B2 |
| priorityDate | 1995-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 19.