| abstract |
(57) [Summary] [Purpose] It has a high light-shielding rate, is easy to form fine patterns by photolithography, and is excellent in insulation, heat resistance, adhesion, and storage stability at room temperature. Provided are a light-shielding thin film forming composition, a light-shielding film formed using the composition, and a black matrix for a color filter. [Structure] (A) The following general formula (1): An unsaturated group-containing compound obtained by further reacting a reaction product of an epoxy compound mainly composed of a compound represented by: with (meth) acrylic acid with a polybasic acid carboxylic acid or an anhydride thereof; A composition comprising a polymerization initiator or a sensitizer, at least one selected from (C) a black organic pigment, a mixed color organic pigment and a light-shielding material, and (D) a compound having an epoxy group, wherein D It is a composition for forming a light-shielding thin film in which the amount of the component is 1 part by weight or less based on 100 parts by weight of the component A. A light-shielding film and a black matrix for a color filter formed by using the composition for forming a light-shielding thin film. |