http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H08262710-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d93502a23a72b56472bc75854cfe7c60 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 1995-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9608ab9e3cc60c8eb87832680e0ab899 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1a3c9e699e9defbdf27909ba324ee5f6 |
| publicationDate | 1996-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H08262710-A |
| titleOfInvention | Positive resist composition |
| abstract | (57) [Summary] [Purpose] To provide a resist composition having excellent sensitivity, resolution, residual film rate, pattern shape, and storage stability. [Structure] (A) A phenol compound having a substituent at any two positions of 2, 4, and 6 and at least one phenol compound other than the phenol compound and an aldehyde are condensed in the presence of an acid catalyst. A positive resist composition containing the resulting alkali-soluble resin and (B) a quinonediazide sulfonic acid ester-based photosensitizer. |
| priorityDate | 1995-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 392.