| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d93502a23a72b56472bc75854cfe7c60 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
1995-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c89eaa7475feef006be6c32832b1cf91
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bdd0386368eaa2489f7fec1f162e0605
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_70cb626ef6fd7aeae77e682370771fb0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ed46cbdbd0d8ac4257cd709c63d06989 |
| publicationDate |
1996-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H08254820-A |
| titleOfInvention |
Resist composition |
| abstract |
(57) [Summary] [Object] To provide a novel radiation-sensitive resist composition. A resist composition comprising a compound having acid decomposability and a partial sulfonic acid ester of polyhydric phenol. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7402372-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7449276-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7666569-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6528240-B1 |
| priorityDate |
1995-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |