| abstract |
(57) [Abstract] [Purpose] To provide a pattern forming method capable of stably producing a pattern with high sensitivity and high resolution. [Structure] A substrate 101 is composed of a compound that produces an acid upon irradiation with radiation, a reactive medium whose solubility in an alkaline aqueous solution is changed by a reaction using an acid as a catalyst, and an environmental resistance factor 102A. A resist layer 102 of a radiation composition is formed, and the resist layer 1 is formed by using an electron beam 103. No. 02, a predetermined pattern latent image is formed, the deactivation of the acid generated by the basic substance 104 at this time is prevented, and then the resist pattern 106 is formed by developing with an alkaline aqueous solution. |