| abstract |
(57) [Summary] [Structure] For example, the following formula: A radiation-sensitive resin composition containing a phenol compound represented by, an alkali-soluble resin, and a 1,2-quinonediazide compound. The radiation-sensitive resin composition of the present invention provides a resist pattern with high sensitivity and excellent pattern shape. Therefore, the radiation-sensitive resin composition can be suitably used as a resist for producing an integrated circuit having a high degree of integration. |