| abstract |
(57) Abstract: High sensitivity, no heat treatment between exposure and development steps, extremely little change in sensitivity and pattern shape due to time change between exposure and development, heat resistance Provided is a photosensitive resin composition having excellent properties such as excellent water-based development and excellent stability over time during storage. SOLUTION: (a) A reaction product of a polymer containing a segment represented by the following general formula (I) and (3,4-epoxycyclohexyl) methyl methacrylate, and (b) a polymerization initiator by irradiation with actinic rays. , And (c) a solvent, Preferably (d) a thermal crosslinking agent and / or a compound having a polymerizable unsaturated bond is included. In some cases, (e) pigment is included. Embedded image |