http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H08202015-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0950e9df7f0e1b73efee1bda859951ad |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-29 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-80 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-68 |
| filingDate | 1994-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3485b9a0749fc1fa3a429cacb7b29211 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ff5233880dda4c0c0e16ffe428dad0b3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9c70e1e3b20e9b48d94082ff6199c5f6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e56f4770841593f2f8314efab333dfc7 |
| publicationDate | 1996-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H08202015-A |
| titleOfInvention | Phase shift mask and manufacturing method thereof |
| abstract | (57) [Summary] [Object] An object of the present invention is to provide a phase shift mask having a fine and highly accurate phase shifter without impairing the light transmittance, and a method for manufacturing the same. [Structure] A phase shifter 2A, 2B, 2C made of an LPD film is provided on a quartz substrate 1. First, a photoresist pattern is formed on a quartz substrate. Immersing this quartz substrate in a silicon oxide supersaturated solution of hydrofluoric acid, A SiO 2 film is formed by depositing silicon oxide from a supersaturated solution on the exposed surface of the quartz substrate that is not covered with the resist pattern. Then, the resist pattern is ashed and removed by oxygen plasma. The SiO 2 film remaining on the quartz substrate 1 functions as a phase shifter. Since an additive for improving the flexibility of the phase shifter is unnecessary, it is possible to provide a phase shift mask having a phase shifter with a uniform film thickness, without causing a decrease in light transmittance and a volume shrinkage during firing. |
| priorityDate | 1993-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 38.