| abstract |
(57) Abstract: A chemical / mechanical polishing slurry for metal layer is provided. SOLUTION: About 40 m uniformly dispersed in an aqueous medium. And a surface area in the range of 2 / g~ about 430m 2 / g, about 1.0 Repulsive to an aggregate size distribution of less than μ, an average aggregate diameter of less than about 0.4μ, and van der Waals forces between particles, A chemical / mechanical polishing slurry for metal layers, which contains high-purity metal oxide fine particles and is colloidally stable, which has sufficient force to overcome this. |