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filingDate 1995-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 1996-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H08194737-A
titleOfInvention Fine pattern step measuring device
abstract (57) [Abstract] [Purpose] The pattern of an etching product is measured with high precision in the dimension in the Z direction as well as the two-dimensional directions in XY. An image is input into a lead frame pattern for each minute section in the X direction and the Y direction, the distance in the Z axis direction between the lead frame and the image input means is changed, and the in-focus point is read by autofocus. Autofocus is performed at at least one location per section, the X and Y coordinate values of that point and the Z coordinate value of the in-focus point are read, and two-dimensional image data for each section and three-dimensional including coordinate values are read. CA Three-dimensional CAD with a step measuring device that converts to D data Measure downset of island 10 above.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2008049370-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015143656-A
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type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 26.