abstract |
(57) [Summary] [Purpose] To provide a resist composition excellent in sensitivity, resolution, residual film rate, and pattern shape. [Structure] An alkali-soluble phenol resin (a), a quinonediazide sulfonic acid ester-based photosensitizer (b) and a condensate (c) of a phenol and an α, α'-2-substituted xylene are contained. Type resist composition. |