http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H08193155-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_097405822d505467fd50f7100022cd56 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
| filingDate | 1995-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_02ab9b8b0c47e63e95b11c9ba07407ba http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_35ef49a48bba3663345b4d0c873f12aa |
| publicationDate | 1996-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H08193155-A |
| titleOfInvention | Resin composition for backing material for shadow mask production |
| abstract | (57) [Summary] [PROBLEMS] To provide a resin composition for a backing material, which is easily cured by irradiation with heat, ultraviolet rays, electron beams or the like and has excellent performance as an etching resist agent in the production of shadow masks. [Structure] Acryloyloxyethyl monophthalate 6 To a mixture of 0 parts by weight (hereinafter, simply referred to as "parts") and 40 parts of diacrylate of bisphenol A ethylene oxide adduct, 0.1 part of 1,10-phenanthroline as a chelating agent, 5 parts of a photoinitiator and 0.1 part of a leveling agent was blended, dissolved and mixed to obtain a resin composition for backing material. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1219680-A4 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1219680-A1 |
| priorityDate | 1995-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 399.