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filingDate 1994-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5e4ef948c6cdb7a84418198ec8fb5a80
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publicationDate 1996-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H08183601-A
titleOfInvention High activation and stabilization treatment method for hydrogen storage metal materials
abstract (57) [Summary] (Modified) [Purpose] Treatment capable of obtaining a hydrogen storage metal material having a surface highly active for hydrogen molecules and a surface inactive for substances having surface poisoning other than hydrogen molecules Provide the law. [Structure] A hydrogen storage metal material, a high-concentration hydrofluoric acid solution or an anhydrous hydrofluoric acid solution, or a solution of an organic compound such as pyridine, triethylamine, or isopropyl alcohol and anhydrous hydrogen fluoride is placed in a reaction vessel, The reaction vessel is heated to a predetermined temperature from the outside, and in the heating process, a film containing a metal fluoride as a main component is formed on the surface of the hydrogen storage metal material to highly activate hydrogen molecules, and A method for highly activating and stabilizing a hydrogen storage metal material, which comprises deactivating a material having surface poisoning.
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